Volume 5, Issue 4 (3-2017)                   2017, 5(4): 45-55 | Back to browse issues page

‎ 20.1001.1.23222352.1395.5.4.5.1

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Investigation of plasma treatment effect of N2+O2 mixture plasma on the photocatalytic properties of titanium dioxide thin films. Iranian Journal of Ceramic Science & Engineering 2017; 5 (4) :45-55
URL: http://ijcse.ir/article-1-471-en.html
Investigation of plasma treatment effect of N2+O2 mixture plasma on the photocatalytic properties of titanium dioxide thin films
Abstract:   (3958 Views)
Titanium dioxide thin films with a thickness of 280 nm were deposited using pulsed DC magnetron reactive sputtering,on glass substrates. In order to deposit a Ti source in an Ar+O2 gas mixture was used with a substrate of temperature 2500c.The X-ray diffraction (XRD) showed anatase phases and Topographical surface using atomic force microscopy (AFM) is studied. Then RF plasma system was changed and treatment effect of N2 + O2 mixture plasma on the reduction concentration of methylene blue dye in the presence of TiO2 thin films evaluated. Finally, the color removal rate (R%) and also degradation reaction rate constant (k) is calculated.characterized.
 
Keywords: Plasmatreatment, TiO2, photocatalyst
Full-Text [PDF 947 kb]   (1179 Downloads)    
Type of Study: Research | Subject: Bioceramics
Received: 2017/08/5 | Accepted: 2017/08/5
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