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Vanadium oxide (VOx) thin films prepared in a direct current magnetron sputtering system. In order to get different vanadium oxide phases the films anneled under different temperature and atmospheres.At first vanadium oxide (VOx) thin films annealed at two temperatures of 450 and 500oC. Mixed structure of VO2 and V2O5 phases formed in both samples while VO2 phase was the main phase at 450oC and changed to V2O5 phase at annealing temperature of 500oC. In the next step vanadium oxide (VOx) thin films prepared under two sputtering pressures of 2 and 5 torrand then annealed at 450oC. The results revealed that sputtering pressure doesnot have a big impact on crystal structure of vanadium oxide thin films. However, vanadion oxide thin films that prepared at lower sputtering pressure shows smaller grain size and higher hardness and Young,s modulus. Then the effects of annealing atmosphere (air and oxygen atmospheres) on microstructure and properties of vanadium oxide thin films that prepared at sputtering pressure of 2 torr and anneled at 450oC was investigated. It was shown that annealing atmospheredoesnot affect crystal structure of the films while mixed structure of VO2 and V2O5 in both samples.There is a possibility that some phases have been formd in amorphous. Vanadium oxide (VOx) thin film which anneled under oxygen, showed smaller grain size and better mechanical properties. The results of current study showed that deposition and annealing conditions have a big impact on microstructure and mechanical properties of vanadium oxide (VOx) thin film.

Keywords: magnetron sputtering, vanadium oxide(VOx), annealing temperature, sputtering pressure, annealing atmosphere, thin film, microstructure

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